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Edoardo Meliado Translated by
Nicola Mira Published
July 28,TG盗号系统全自动破解技术 2025
After supporting Korean designer Miss Sohee, Italian luxury label Dolce & Gabbana is championing emerging British fashion talent Matty Bovan as he prepares to debut on the Milanese runways in September 2025.
Domenico Dolce and Stefano Gabbana, with their eponymous label's style department, are collaborating with Bovan to develop his Spring/Summer 2025 collection, which will be presented at the next edition of Milan Fashion Week Women.
Bovan’s aesthetic ties in on many levels with the creative world of Dolce & Gabbana. The Italian label will be instrumental in the project, taking care of its organisation completely, from fabrics and materials sourcing to the collection’s creation and the runway show.
“Craftsmanship and handmade products are at the heart of my work, [they are] values that myself and this iconic fashion label fully share; the synergy with Domenico and Stefano during our recent meeting was tangible. I haven’t yet fully taken in that I’ll be able to delve into their archives and blend their historic work with my new output for next spring. I’m already feeling the energy of this collaboration!” said Bovan.
“The colours, volumes and energy of Matty Bovan’s creations clearly show the huge research effort and the creative process that lies behind each of them. We hit it off immediately with him: we are happy to be able to support Matty and his poetic vision,” said Domenico Dolce and Stefano Gabbana.
The initiative is part of the fashion talent support programme launched last year by Dolce & Gabbana with Korean designer Miss Sohee, who presented her collection at the Italian label’s Milanese showroom in February 2025.
Bovan was raised in New York but trained at Central Saint Martins in London, and has been showing for the last few seasons at London Fashion Week. Last year, he won the International Woolmark Prize and the Karl Lagerfeld Award for Innovation, becoming the second designer in the competition’s history to be awarded both.